Summary: Chemist with a strong back ground in the development of polymers, organic pigments, organic intermediates, photo-active compounds for chemical and electronics industries. Skills include research for product development, cost savings, and introduction of new products into manufacturing worldwide. Confirmed individual and team contributions for R&D, supervisory and collaboration for overseas projects and an excellent track record of performance in fast paced environments.
Education: Bachelor of Science (•••••) University of Rhode Island, Resource Development with a minor in Chemistry. B.S. Chemistry (•••••).
•••••Present, Development Chemist, Flint Group, Cincinnati, Ohio. Responsible for the overall R & D, quality of organic pigments (Sales of $••••• million) produced at the Cincinnati site. Conduct and design all experiments for cost savings and Research for new and/or improved pigments at the Cincinnati site. Direct scale up and coordinate activities from lab to the plant. Direct R & D projects and scale-up activities at our Shanghai, China facility.
•••••, Plant Chemist, Engelhard Corporation, Louisville, KY •••••
Responsible for the overall quality of organic pigments (Sales of $••••• million) produced at the Louisville site. Direct scale up activities from lab to pilot plant, then to the plant. Supervise activities of three plant support chemists to increase the overall quality of the batch operations.
Responsible for automating batch recipe control through Wonderware, In-Batch software.
•••••, Chief Chemist, Hoechst Celanese Corporation, Coventry, R.I. •••••
Responsible for the overall quality of organic pigments (Sales of $••••• million) produced in the United States and the integration of new or existing European products into the domestic manufacturing process. Managed technicians and chemist in a production quality assurance laboratory. Developed and implemented vendor specifications for raw materials used in manufactured products. Qualified raw materials from non-traditional sources resulting in considerable savings over a short period of time. Instrumental in developing, coordinating, and completing quality process at a plant site that achieved ISO ••••• certification.
••••• Scientist 1, Hoechst Celanese Corporation, Technical Operations, Branchburg, N.J•••••
Materials Research and Development Group responsible for the Syntheses, process development, and metal reduction in the area of Novolak Resins and Diazo Compounds. Developed and responsible for scale up through the pilot plant into production with complete quality follow through.
••••• Senior Lab Technician, Hoechst Celanese Corporation, Technical Operations Branchburg, N.J••••• Assisted Dr. M.D. Rahman with support for the Electronic Products Division. Main concentration of work: novolak resin development, process improvement development and follow up through pilot plant into production.
••••• Senior Pilot Plant Technician, Hoechst Celanese Corporation, Coventry, R.I.
Responsibilities include planning set-up, and production of products including, dyes, dye intermediates, diazo compounds, photoresists, and various polymers.
••••• Chemist, Royal Electric, Pawtucket, R.I. R & D for materials used in insulating and jacket compounds. Polymer experience includes CPE, EPDM, NBR/PVC, Neoprene. Banbury Experience #9 and •••••oduced new wire coatings and insulating compounds. Conduced technical development and assisted sales for quality and improved cost savings.
••••• Chemist, Olin Hunt Corporation, Lincoln, R.I••••• Conduct process lab experiments and supervise pilot plant trials for photographic and photoresist intermediates.
••••• Chemist, C.N.C. International, Woonsocket, R.I. Conduct lab experiments and plant trials for the Pulp and Paper Division. Developed anti foaming agents and flame-retar•••••ts.
••••• Chemist, Carroll Products Inc. Wood River Junction, R.I. Conduct lab experiments and process development into production of precursors for the photoresist industry.
Awards: Level I and II, Recognition for quality performance, Hoechst Celanese •••••, ••••• and •••••
Level II EQ award for quality performance, Engelhard Corporation •••••
Patents: M.D. Rahman, D. •••••, R.R. Dammel, D.L. Durham, and P.H. Lu, Using a Lewis Base to Control Molecular Weight of Novolak Resins, Filed, •••••
M.D. Rahman, D. •••••, P.H. Lu, and M. Khadim, Novolak-Polyhydroxystyrene Copolmer and Photoresist Compositions, Filed, •••••
•••••iel P. ••••• and M.D. Rahman RFPA #•••••/••••• Isolation of Novolak in Low Temperature by Sub Surface Forced Steam Distillation.
M.D. Rahman, D. •••••, •••••nzie and D. Khanna RFPA #•••••/••••• Making Para Resin in Acetone to Remove Metals and 2,1,5 Diazosulphonylchloride Esters.
M.D. Rahman, D. •••••, D. McKenzie and D. Khanna RFPA #•••••/••••• Reducing Metals from Novolak Resin Solution by Acetone and or Methanol using Ion Exchange.
M.D. Rahman, D. •••••, D. Khanna and S. Dixit RFPA #•••••/••••• Fractionation and Metal Reduction of Novolak Resin Solutions.
M.D. Rahman, D. •••••, D. Khanna and S. Wanat RFPA #•••••/••••• Using PGMEA and MMB in a Mixed solvent System for Photoresist Formulations.
M.D. Rahman, D. •••••, D. Khanna Metal Ion Free TPPA (4,•••••[•••••[•••••[•••••(•••••Hydroxyphenyl)•••••
M.D. Rahman, D. •••••, E. Kokinda, D. Durham RFPA #•••••/••••• Using Acidic Ion Exchange Resin as a Catalyst to Synthesize Novolak Resin for Photoresist Composition.
M.D. Rahman, D. •••••, D. Khanna and D. McKenzie RFPA #•••••/••••• Metal Ion Reduction in Novolak Resin Using an Ion Exchange Catalyst in a Polar Solvent and Photoresists Compositions Therefrom.
M.D. Rahman and D. ••••• RFPA #•••••/••••• Continuous Fractionation of Novolak Resin.
SPIE: SPIE (Society of Photo-Optical Instrumentation Engineers); Papers Published:
•••••iel P. •••••, M.D. Rahman and D. Khanna Isolation of Novolak Resin at Low Temperature
Filed August •••••
Additional Patents and papers published furnished upon request.
Military Experience: ••••• •••••, Search and Rescue Helicopter Crewman, U.S. Navy.
organic, polyomer, scale up